Enhancing Photodetection Efficiency of CMOS SiPMs using Virtual Guard
Rings in a Standard 0.35 μm Process
Abstract
In this letter, we introduce a design of virtual guarded SiPMs
fabricated in a standard 0.35 μm standard complementary metal oxide
semiconductor (CMOS) process. We compare the performance of these
virtual guarded cells (VGC) to that of conventional cells with real
guard rings, referred to as physical guarded cells (PGC). Specifically,
we evaluate the photon detection efficiency (PDE) of both types of
SiPMs. Our results demonstrate that the VGC SiPM outperforms the PGC
SiPM, exhibiting a true PDE of (22.5 ± 0.5) %, which is significantly
higher than the PDE of (10.9 ± 0.3) % obtained for the PGC SiPM. The
superior PDE of the VGC SiPM is attributed to a larger active or
photosensitive area due to the virtual guard rings and a thinner n-layer
in the photosensitive region.